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TiSi2 Phase Formation in Magnetron-Sputtered Ti Films on Silicon
Professor Alex Volinsky · 5 ноября 2026 г. · 6 мин
Got something to say to this podcast? Send a voicemail, and you might hear yourself on the next episode! Elena and Marcus discuss a new Nanomaterials (2026) paper: magnetron-sputtered titanium films on silicon form the low-resistivity C54 TiSi2 phase directly at 600 degrees Celsius in vacuum, cutting sheet resistance about thirty-fold, and why annealing in nitrogen gives a completely different result. First episode of the New-Paper Fast Lane. Note: voices in this episode are AI-generated: Elena and Marcus.